Porous Carbon Pad (Porous Vacuum Chucks)
Carbon conductivity prevents damage caused by sparks
Product Introduction
Φ450mm compatible
Carbon precision vacuum chucks
Φ300mm Porous Carbon Pad (Porous Vacuum Chucks)
● This is a vacuum chucks composed entirely of carbon materials, combining a porous carbon adsorbent with a high-strength carbon structural body.
● It enables full-surface adsorption of silicon wafers, BG tape, die attach film, and dicing tape using the porous material.
● With an average pore diameter as fine as 5 μm, it prevents transfer of adsorption marks.
● Partial adsorption is also possible thanks to its appropriate throttling effect.
● It resists deformation and damage even under severe temperature conditions.
● Its excellent electrical properties make it effective for static electricity control.
This is a porous vacuum chucks that maximally leverages the unique characteristics of carbon.
Features
Material | Porous Carbon | Alumina | Aluminum |
|---|---|---|---|
Electrical resistance value (μΩ・m) | 100 | > 1X10^12 | 2.6 X 10^-2 |
1. Wafer Antistatic Protection
Carbon is an excellent conductor.
Since it is resistant to static buildup, the workpiece is grounded when adsorbed.
This is effective as a static electricity countermeasure and is ideal for adsorbing static-sensitive workpieces.
With coating (optional specification), the surface resistance can be adjusted to a specified value.
2. Compatible with High-Temperature Environments
By using carbon for all component materials, the excellent thermal properties of carbon are maximized.
The heat resistance temperature is 250°C in the atmosphere and 900°C in an inert gas environment.
It has high thermal shock resistance and will not break even under rapid heating and cooling.
Because it is composed of a single material, it is less prone to dimensional changes due to differences in thermal expansion, offering excellent dimensional stability.
3. Reduced Load on Equipment Through Weight Reduction
The bulk density of porous carbon is as low as 1.2 g/cm³.
Compared to ceramic adsorption chucks, weight can be reduced by about 40%.
In addition to increasing design flexibility for equipment, the weight reduction helps rationalize components and brings further cost advantages to equipment manufacturing.
Material | Porous Carbon | Alumina | Aluminum |
|---|---|---|---|
Bulk density (g/cm³) | 1.2 | 3.6 | 2.8 |
Partial Adsorption
Weight Measurement
Weight Table
Vacuum surface size (mm) | Thickness (mm) | Weight (g) | Image |
|---|---|---|---|
Φ200 | 12 | 750 | |
Φ300 | 12 | 1580 | |
Φ450 | 20 | 5660 |
Looking for a better solution?
① Prevent Sparks and Protect Wafers
Facing issues with static discharge sparks?
To address sparks caused by static electricity, slow leakage (slow discharge) is an effective solution.
Slow leakage occurs when the surface resistance falls within the static dissipation range of 10⁵ to 10⁹ Ω.
With our all-carbon vacuum suction pad, the surface resistance can be adjusted through coating.
This helps suppress spark generation during wafer adsorption and release, protects the wafer, and reduces the load on the equipment.
Sample Data
[Measurement object] ⌀300mm porous carbon pad
(Tanken coat mounted product)
[Measurement instrument] Surface resistance measuring instrument PRS-801
(Manufactured by PROSTAT)
[Measurement location] Our laboratory
[Measurement result] 2.0 x 10^6 Ω
② Stabilize Products Through Uniform Heat Distribution
Struggling with film peeling issues?
Uneven film peeling is often caused by inconsistent temperature distribution during heat treatment.
To solve this, ensuring uniform temperature across the suction pad is key.
The all-carbon vacuum suction pad maintains a surface temperature variation within ±2.5°C, meeting the strict requirements of wafer heating equipment.
By equalizing the temperature distribution, the thermal curing of DAF tape becomes consistent, preventing film peeling defects and stabilizing product quality.
Experimental Condition
[Test object] ⌀300mm porous carbon pad
[Heating body] Hot plate LS45P (Manufactured by Hakko Electric Co., Ltd.)
[Heating temperature] 150°C
[Measuring instrument] Thermo Tracer TH7102
[Measurement location] Partner company laboratory
③ Eliminate Adsorption Marks and Improve Coating Precision
Experiencing coating defects with your spin coater?
To address coating irregularities, full-surface adsorption using a porous material is highly effective.
These defects are often caused by adsorption marks where the wafer is pulled into suction holes—especially noticeable with ultra-thin wafers.
The porous carbon vacuum chucks uses a porous surface finished to a high-precision flatness, improving coating accuracy.
Its excellent chemical resistance also ensures suitability in various processing environments.
Upgrading your equipment is as simple as replacing the spinner head.
Spinner Head
④ Streamline Changeovers with Size Compatibility
Losing time due to setup changes for different wafer sizes?
With a multi-pad design, the adsorption area can be switched according to wafer size.
One porous carbon pad can handle multiple wafer sizes, eliminating the need for frequent replacements.
It consistently delivers optimal adsorption performance without changing the setup.
The adsorption area can also be customized to meet your required size and position.
Multi-pad (Compatible with ⌀300mm - ⌀200mm)
Applications
① Semiconductor Manufacturing (Back-End Process) — By Equipment Type
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Adsorption table for wafer surface protection tape application
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Adsorption table for wafer surface protection tape removal
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Adsorption table for wafer inspection equipment
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Adsorption table for UV exposure equipment
-
Vacuum chucking for material handling in wafer mounter equipment
-
Spinner head for wafer cleaning equipment, etc.
② Semiconductor Manufacturing (Back-End Process) — By Process Stage
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TSV process
-
Dicing process
-
Backgrinding process
Specifications
Product specifications are shown below.
We can also accommodate various customizations. The final shape will be determined in consultation with the customer.
Material | Porous Carbon (High strength carbon) | Porous Carbon X (Other materials) |
|---|---|---|
Working pressure range | -0.1MPa ~ 0.1MPa | -0.1MPa ~ 0.1MPa |
Operating temperature range | ～ 250℃ | 23℃ ± 2℃ |
Available dimensions (Adsorption surface) | ～Φ450 mm
～Φ350 mm | ～Φ450 mm
～Φ350 mm |
Available dimensions (Thickness) | 12 mm ～ | 15 mm ～
(For metal materials) |
Flatness | 10 μm ～ | 5 μm ～ |
Coating | O | Negotiable |
Multi-pad | O | O |
Optional Specifications
-
Coating
Applying a coating to the adsorption surface further enhances the performance of the porous carbon pad.
Additional functions such as surface resistance adjustment, improved release properties, and contamination prevention can be added.
Available coating materials include resin-based and glass-based types.
We will select the most suitable coating based on your specifications.
-
Multi-pad
A switching function for the adsorption surface can be added.
Please specify the number and positions of the divided adsorption areas.
-
Holder Material Customization
The holder can be manufactured using the material of your choice.
In addition to high-strength carbon, we offer options such as metal, CFRP, and resin.
We can accommodate your preferred material.
※Note: When changing the holder material, the adsorption surface will protrude above the top of the holder.
Holder material: Aluminum
Creating a Design Sheet
When making an inquiry, please use the “Design Sheet” below along with the product specifications.
We will provide a quotation and delivery schedule based on the information provided.
Please have the following items ready to assist us in providing you with a smooth response.
Precautions for Use
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We recommend using the porous carbon pad (porous vacuum chucks) in a clean environment.
-
Its performance may be compromised in environments where oil or moisture is present.
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The flatness of this product is guaranteed at 23 °C ± 2 °C.
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Please specify the usage environment when making an inquiry.